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Tel: 0551-63484895

After Sales: 4006082908

Headquarters address: No. 4708 Yungu Road, Economic and Technological Development Zone, Hefei City, Anhui Province, China

Produce address: Zhenping Technology Industrial Park, No. 4345 Tiandu Road, Hefei Economic and Technological Development Zone, Anhui Province, China

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Quick reaction network with a furnace

The research of precious metal thick film firing, silver slurry sintering, low -temperature co -burning ceramics (LTCC), glass film annealing, hybrid integrated circuit, and other high -temperature air atmosphere.

Keywords: Semiconductor specific equipment

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Description

Application field:

The research of precious metal thick film firing, silver slurry sintering, low -temperature co -burning ceramics (LTCC), glass film annealing, hybrid integrated circuit, and other high -temperature air atmosphere.

Characteristic

Accurate air import

Heating component control to improve temperature uniformity

Reliable transmission system adapts to extensive loading configuration

HMI has built -in analysis, data and event logs

Can be customized to meet specific processing requirements

Specification

Typical parameter

Remark

Temperature use range (℃)

200~1050

 

Net bandwidth(mm)

150~1000

Note1

Bring speed range(mm/min)

25~200

 

Temperature uniformity(℃)

±2~5

Note2

Control the warm zone

4~13

 

Cooling method

Air convection/forced wind and cold/water cooling

 

Note 1: The width of the typical mesh is 150/300/500/635/1000;
Note 2: You can meet different standards according to different control methods;

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